Carl Zeiss SMT and ASML publish paper on Hyper-NA EUV lithography
Researchers have detailed optical architectures for Hyper-NA EUV lithography systems featuring a numerical aperture of at least 0.75 to advance semiconductor manufacturing beyond High-NA standards.
FTMQ SI, written by our newsroom0 views
Researchers at Carl Zeiss SMT and ASML have published a technical paper titled Hyper-NA: a system with a numerical aperture of at least 0.75, Semiconductor Engineering reported. The paper details plans to extend photolithography capabilities past current High-NA extreme ultraviolet systems. [1]
According to Semiconductor Engineering, the research team examined Hyper-NA extreme ultraviolet lithography systems featuring a numerical aperture of at least 0.75. The publication covers the optical architecture, resolution potential, and reticle three-dimensional effects associated with the technology. [1]
Extreme ultraviolet lithography is a photolithography technology used in the semiconductor industry to manufacture integrated circuits. The process utilizes 13.5 nanometer extreme ultraviolet light to form intricate patterns on semiconductor substrates. [3]
The proposed Hyper-NA systems are designed as a path beyond current 0.55 numerical aperture High-NA systems, Semiconductor Engineering reported. The research addresses optical extensions required for future semiconductor fabrication steps. [1]
In short
- Carl Zeiss SMT and ASML researchers published a technical paper on Hyper-NA EUV lithography.
- Hyper-NA systems feature a numerical aperture of at least 0.75.
- Current High-NA EUV systems operate with a numerical aperture of 0.55.
- Extreme ultraviolet lithography uses 13.5 nanometer wavelength light to manufacture integrated circuits.
Sources
Every paragraph above points to the numbered items it rests on. Read the originals here.
- [1]Hyper-NA EUV: The Next Extension Beyond High NA Lithography (Carl Zeiss, ASML)Semiconductor Engineering, 7h ago (the report this story comes from)
Background
- [2]OpenGL on Wikipedia
- [3]EUV lithography on Wikipedia
Our newsroom writes these reports with the help of software, from the 3 sources listed and nothing else, and checks them against those sources. Facts can still be wrong or move on; the originals are the record. Spotted a mistake? Write to daniel@monsterkong.com.
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